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Plasma Charging Damage Kin P. Cheung 2001 edition
Plasma Charging Damage
Kin P. Cheung
In the 50 years since the invention of transistor, silicon integrated circuit (IC) technology has made astonishing advances. In state of the art silicon Ie manufacturing process, plasma is used in more than 20 different critical steps.
346 pages, biography
| Media | Boeken Hardcover Book (Boek met harde rug en kaft) |
| Vrijgegeven | 4 oktober 2000 |
| ISBN13 | 9781852331443 |
| Uitgevers | Springer London Ltd |
| Pagina's | 346 |
| Afmetingen | 155 × 235 × 20 mm · 657 g |
| Taal en grammatica | Engels |